2018
  • Non-ICIMOD publication

Share

575 Views
Generated with Avocode. icon 1 Mask color swatch
0 Downloads

Landslide Loss and Damage in Sindhupalchok District, Nepal: Comparing Income Groups with Implications for Compensation and Relief

  • Van Der Geest, K.
  • Summary

Accurate wavefront aberration measurement are essential for\nnext-generation Extreme Ultraviolet (EUV) Lithography. During the past\nyears several accurate interferometric techniques have been developed,\nbut these techniques have limitation. In this work we discuss a\ndifferent technique based on the Hartmann Wavefront Sensor that requires\nno interferometry. We present a mathematical model of this system and\ndescribe our experimental setup which demonstrates the feasibility and\nadvantages in terms of dynamic range and accuracy compared to\ninterferometric techniques.

Keywords